The Core Technology For Surface Modification Of Titanium Alloys: Nqus Txheej Ntawm Titanium Alloys

Titanium alloy nqus tsev vacuum txheejyog ib lub tshuab tseem ceeb rau kev hloov kho saum npoo ntawm titanium alloys. Nws lub hom phiaj tseem ceeb yog txhawm rau them nyiaj rau qhov tsis zoo hauv cheeb tsam ntawm titanium alloys (xws li hnav tsis kam, corrosion kuj, siab -kub oxidation tsis kam, thiab kev sib txhuam txo) thaum khaws lawv qhov zoo ntawm lub zog thiab lub teeb yuag. Nws yog dav siv nyob rau hauv siab -kawg teb xws li aerospace, kev kho mob, precision machinery, thiab automotive industries.

Yam yuavtsum tau kawm uantej rau Titanium Alloy Nqus Txheej Txheej (Ua ntej, qhia meej txog kev sib raug zoo)

• Characteristics of titanium alloy substrate: The surface easily forms a natural, dense TiO₂ passivation film (thickness 5-10nm), which provides good corrosion resistance. However, it has low hardness (pure titanium HV150-200, TC4 titanium alloy HV300-350), poor wear resistance, and is prone to oxidation and peeling at high temperatures (>400 degree). Nqus txheej yuav tsum kov yeej cov zaj duab xis passivation kom muaj zog adhesion ntawm zaj duab xis thiab substrate.
• Cov txheej txheem txheej txheem tseem ceeb: ① Adhesion Ntau dua lossis sib npaug ntawm 50N (kev sim khawb / ntsuas tensile); ② ntom thiab pore- yeeb yaj kiab dawb; ③ Tau tshaj lub toughness ntawm titanium alloy substrate, tiv thaiv nkig tawg; ④ Tsis cuam tshuam rau cov khoom siv hluav taws xob ntawm lub substrate nws tus kheej.
• Cov txiaj ntsig tseem ceeb: Txheej hauv lub tshuab nqus tsev (lub tshuab nqus tsev kawm ntawv qib 10⁻³ ~ 10⁻⁶Pa) ua kom tsis muaj oxidation lossis impurity paug, ua rau cov yeeb yaj kiab zoo sib xws thiab tswj tau tuab (0.5-50μm). Nws yog tsim rau complex-shaped titanium alloy workpieces (xws li titanium rods, titanium alloy hniav, thiab kev kho mob cog).

Txheej txheem: Magnetron sputtering txheej (txoj kev tseem ceeb tshaj plaws, haum rau nruab nrab thiab qis kub, siab - daim ntawv thov precision)

1. Lub Ntsiab Cai
Nyob rau hauv lub siab -chamber nqus tsev vacuum, electrons raug kaw los ntawm magnetic teb los bombard lub hom phiaj cov khoom (hlau / ceramic phiaj), ua rau lub hom phiaj atoms / ions mus detach thiab deposit mus rau lub titanium alloy substrate nto, tsim ib tug tuab zaj duab xis txheej. Cov txheej txheem no poob rau hauv qeb ntawm lub cev vapor deposition (PVD).

2. Dedicated Core txheej txheem rau Titanium Alloys (Qhov tseem ceeb nyob rau hauv Substrate Pre- kev kho mob, uas txiav txim siab lub zog sib txuas)
Substrate Pre-kev kho mob (Core kauj ruam, tso nyiaj rau 70% ntawm txheej zoo)
Rough tu: Ultrasonic tu (acetone + cawv) kom tshem tawm cov roj thiab hmoov av, tom qab ziab;
Passivation zaj duab xis tshem tawm: Argon ion etching (lub tshuab nqus tsev kawm ntawv qib 10⁻³Pa, argon siab 0.5-1Pa, bias voltage -100 ~ -300V, lub sij hawm 15-30min) txhawm rau rhuav TiO₂ zaj duab xis, nthuav tawm ib qho tshiab titanium nto, thiab ib txhij roughen 0.3 txheej txheej. kev sib tshuam;
Preheating: Preheating titanium alloy substrate rau 150-300℃kom txo tau qhov kub thiab txias sib txawv ntawm cov zaj duab xis thiab substrate thiab tiv thaiv zaj duab xis tawg.
Txheej txheej txheej (ob kauj ruam: thawj txheej txheej, tom qab ntawd tso tawm)
Lub hauv paus txheej: Ua ntej, txheej txheej hloov pauv tau muab tso rau (Ti txheej lossis Cr txheej, tuab 0.1-0.5μm) txhawm rau tshem tawm cov lattice mismatch ntawm titanium alloy thiab cov yeeb yaj kiab ua haujlwm thiab txhim kho kev sib raug zoo. Parameters: lub hom phiaj tam sim no 2-5A, bias voltage -50 ~ -100V, lub sij hawm 5-10min;
Kev ua haujlwm txheej txheej: Xaiv cov khoom siv raws li kev xav tau, tswj cov yeeb yaj kiab tuab. Cov ntsiab lus tseem ceeb: lub tshuab nqus tsev kawm ntawv 10⁻⁴ ~ 10⁻⁵Pa, argon ntws tus nqi 20-50sccm, lub hom phiaj tam sim no 3-8A, tsis zoo voltage -30 ~ -80V, deposition kub tsawg dua los yog sib npaug li 400℃(kom tsis txhob annealing thiab softening ntawm titanium alloy).
Tom qab-kev kho mob: Kev ua kom txias txias rau chav sov tom qab tshem tawm ntawm lub qhov cub. High-qhov kawg tuaj yeem ua rau qis-kub annealing (150-200℃× 1h) txhawm rau tshem tawm kev ntxhov siab sab hauv hauv zaj duab xis.

Daim ntawv thov raug xwm txheej ntawm Titanium Alloy Nqus Txheej Txheej (Cim Txheej Txheem Xaiv)

1. Aerospace teb: Titanium alloy hniav, connectors → Ion nitriding + TiAlN multi- arc txheej; Titanium alloy precision shafts → Magnetron sputtering TiCN txheej;
2. Kev kho mob: Titanium alloy pob qij txha, pob txha taub hau → Magnetron sputtering DLC ​​​​coating (biocompatible); Titanium alloy implants → Nqus arc ion plating (tsis yog - lom);
3. Precision machinery teb: Titanium alloy cov cuab yeej, pwm → TiN / TiCN magnetron sputtering; Titanium alloy sliders → DLC txheej;
4. Marine engineering teb: Titanium alloy fasteners, kav dej → CrN magnetron sputtering (ntsev tshuaj tiv thaiv corrosion);
5. Kho kom zoo nkauj teb: Titanium alloy hniav nyiaj hniav kub → Nqus evaporation plating Au/TiN (ci xim).